DetailSEM/SAM+XPS System
Flexible and Upgradable SEM/SAM+XPS System for Better and Deeper Analysis of Sample Surface
This system is designed to perform XPS analysis with an X-Ray source, in combination with Scanning Electron and Auger Microscopy with an electron source and a secondary electron detector as part of the analysis system. With this system 2 analysis methods are combined to give a complementary, better and deeper understanding regarding sample surface properties.
This system provides:
- High resolution
- High sensitivity
- Low Background
- X-ray Spectroscopy performance
- Auger Spectroscopy performance
- Electron and Auger Microscopy
It provides the scientist with an optimized solution. The system allows to start with a basic configuration for SEM/SAM+XPS and expand with upgrade options towards improved performance or expand to additional analysis methods. This means the system can grow depending of additional requirements and needs.
The possibility of coupling the system to other UHV systems as well as adapting the system for fulfilling customized criteria is also available.
The system basis consists basically in the following items:
- µ-metal analysis chamber
- PHOIBOS Analyzer (100 or 150) with 2 Ddetector
- Manipulator with until 5 axis of movement option and heating and cooling option
- X-ray source (different spot options)
- Focused electron source
- Secondary electron detector
- Water Cooling System for Source and pumping system
- Load lock chamber for sample introduction with sample storage and sample heating options
- Extension possibility for possible preparation or reaction chamber
- Pumping system
- Bake-out system
- Electronic
- SPECS software for data acquisition, data analysis, remote control and automation possibility
Additional and optional items
- Ion gun for sample cleaning (IQE 11/35) (recommended)
- Ion gun for sample cleaning and sputtering depth profiling (IQE 12/38)
- Flood Gun (FG 22/35) for sample charge neutralization
- Combination of Low energetic ion gun and Flood Gun for sample charge neutralization
- Ultraviolet source for UPS measurements (UVS 10/35 or µSIRIUS)
- Sample camera
- Laser pointer