DetailFOCUS EFM 3i
The EFM 3 with its proprietary cooling concept has been the first commercial evaporator using an integrated flux monitor. Adds ion suppression to the classic EFM3 to prevent high energetic ions generating defects at the surface.
This device is a product of FOCUS GmbH. Further details can be found here: FOCUS EFM 3i
The EFM 3i is specifically designed to facilitate layer-by-layer growth in cases where it does not occur naturally.
It allows for the controlled evaporation of the target material, and the simultaneous generation of ions to create additional surface defects (Ion-Beam-Assisted Deposition, IBAD).
The ions can be produced either by an intrinsic process from the evaporated target material, or from inert gases with the help of an integrated gas inlet. The ions are focused onto the substrate by an electro-static lens. This focusing lens can adjust the ratio of ions to neutrals within the deposition area at the target and hence the additionally induced defect density.
Alternatively sensitive substrate materials can be protected against ion bombardment by a repelling lens voltage (see EFM3s).
The dedicated EVC 300i power supply supports not only the evaporation process but also supplies the additional lens voltage and includes a sample current meter.
Due to the special design of the ionization region the max. crucible size is limited.
See also: J.Kirschner, H. Engelhard, and D. Hartung, Rev. Sci. Instrum., Vol. 73, No. 11, p. 3853-3860, 2002.
SPECIFICATIONS
| Number of Pockets | 1 |
| Water Cooling | internal |
| E-beam power | 400 W |
| Operating Pressure | < 10-10 - 10-5 mbar |
| Optional Accessories | Non standard lengths |
| Mounting Flange | NW35CF (2.75 ") |
| Insertion Depth | 210 mm |
| Max. Rod Feed | 50 mm |
| Max. Crucible Size | 0.25 cc |
| Power Supply | 400 W |
| Shutter | Motorized shutter |
