Detail

Surface Preparation

In order to obtain relevant results by cutting edge characterization methods it requires the preparation and deposition of well-defined and clean materials surfaces and interfaces. Classical techniques for surface preparation are: cleaving, sputter cleaning, annealing and reactive heating.

RELATED PRODUCTS

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Digital Power Supply for IQE 11/35

Radio Frequency Hybrid Plasma Source for Reactive Gases

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Microwave Atom Plasma Source for Reactive Gases

Microwave Hybrid Plasma Source for Reducing Gases

Microwave Hybrid Plasma Source for Reactive Gases

Microwave Ion Plasma Source for Reducing Gases

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Radio Frequency Atom Plasma Source for Reactive Gases

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PCS-RF-PS (300/600/MT/AT)

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System Module for Sample Preparation

Exractor Type Ion Source Optimized for Sample Cleaning.

Extractor Type Scannable Ion Source

Penning Discharge Type Cold Cathode Ion Source

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Multimethod Cluster with ARPES, SPM, LEEM and IonTof Qtac

Multimethod System with XPS, PVD and Sputter Deposition

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Multimethod System with XPS, Preparation and Sputter Deposition

Cluster System with XPS Preparation and Sputter Deposition

SPECS MBE System for Sample Preparation

Mini Microwave Atom Plasma Source for Reducing Gases

Mini Microwave Atom Plasma Source for Reactive Gases

Mini Microwave Hybrid Plasma Source for Reducing Gases

Mini Microwave Hybrid Plasma Source for Reactive Gases

Mini Microwave Ion Plasma Source for Reducing Gases

Mini Microwave Ion Plasma Source for Reactive Gases

Multimethod System with XPS, SPM and UHV Prepration

Multimethod System with Preparation, XPS and SPM

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