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Differential Pumping for IQE 12/38

Differential Pumping System for IQE 12/38 Ion Source for Ultra Clean Applications

Differential pumping is used to maintain a large pressure difference between the UHV chamber and the IQE 12/38 ion  source. This technique enables to maintain ultra low pressure in the chamber even during the sample preparation. The differential pumping unit consists of VAT angle valves (all metal), tubings and fittings connected to a  pumping stage (turbo pump, membran pump and controller). 

KEY FEATURES

  • Ultra low pressure during during sample preparation
  • High pumping efficiency
  • Pumping stage: turbo pump, membran pump and controller
  • VAT angle valves (all metal)
  • Tubings and fittings included

MADE FOR THESE METHODS

3
(LE)ISS
Low Energy Ion Scattering Spectroscopy (LEISS) is the most surface sensitive method for chemical analysis. Only the topmost layer is probed.
Sputter Depth Profiling
Film Thicknesses of multilayer samples and the depth distribution of elements can be characterized by sputter depth profiling.
Charge Compensation
Methods to compensate positive or negative charging of insulating sample surfaces during characterization with charged particles, like XPS and SEM.
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