DetailFOCUS EFM 4
The EFM 4 provides the same features as the EFM 3 but is intended for the deposition on substrates with a larger diameter up to about 50 mm.
The EFM 4 provides the same features as the EFM 3 but is intended for the deposition on substrates with a larger diameter up to about 50 mm.
The three different exit apertures allow to adapt the evaporation area exactly to the size of the sample. Evaporation rates varying from 1/10 monolayer per minute to over 1000 monolayers per second can be achieved by selection of the appropriate crucible and e-beam power.
The EFM 4 is suitable for crucible capacities up to 700 mm3.
The effective water-cooling ensures low background pressure (typically in the 10-10 mbar range) even during prolonged operation at high evaporant temperatures.
Due to the larger evaporation areas being targeted the operation of the EFM 4 with the EVC 300 power supply is the most suitable configuration.
KEY FEATURES
- Evaporation area Ø 10 – 133 mm
- Flux monitor
- Integrated shutter
- Crucible capacity up to about 700 mm3
- Mounting flange NW 35 CF
- All other features same as EFM 3
SPECIFICATIONS
| Number of Pockets | 1 |
| Water Cooling | internal |
| E-beam power | 300 W |
| Operating Pressure | < 10-10 - 10-5 mbar |
| Optional Accessories | Non standard lengths |
| Mounting Flange | NW35CF (2.75 ") |
| Insertion Depth | 210 mm |
| Max. Rod Feed | 25 mm |
| Power Supply | 300 W |
| Shutter | Motorized shutter |
